Features■ PTFE element with superior corrosion resistance and excellent compatibility for most high purity semiconductor process gases.■ 3 Nanometer particle filtering capability keeps up high flow efficiency with minimum pressure drop.■ 5Ra electro-polished surface prevents internal contaminations.■ Baked with hot nitrogen after DI water cleaning to meet semiconductor process standards.■ Class 100 manufacturing, cleaning and packaging environment.■ 100% helium leak tested.Ordering Information
| Size |
Connection |
| 4 |
1/4" |
VM |
MFS male type |
| 6 |
3/8" |
SW |
Lok type |
| 8 |
1/2" |
|
|
Specifications
| Removal Rating |
≥ 0.0025 ㎛ |
| Retention |
Greater than 99.9999999% Removal of all particles down to 0.0025 ㎛ |
| Rated flow @ 109 |
50 SLPM |
| 100 SLPM |
| 150 SLPM |
| Materials |
Filter element |
PTFE / PFA / PTFE |
| Elctropolished housing |
SM/DM 316L Stainless steel |
| Operationg conditions |
Maximum inlet pressure |
0.98 MPa (10kgf/cm2) at 20 °C |
| Maximum differential pressure |
0.4 MPa (4.2kgf/cm2) at 20 °C |
| Maximum operating temperature |
120 °C (Inert gas) |
| Helium leak rating |
1 x 10-9 atm · cc / sec |
| Surface finish interior |
≤ Ra 5μin |
Dimensions
| PartNo. |
A/mm |
B/mm |
C/mm |
D/mm |
E/mm |
F/mm |
H/mm |
| ST-A50-4VM |
15.5 |
53 |
15.5 |
21.5 |
23.5 |
22 |
84 |
| ST-A50-4SW |
10.4 |
52.2 |
10.4 |
21.5 |
23.5 |
22 |
73 |
| ST-A100-4VM |
15.5 |
96 |
15.5 |
26.5 |
30 |
27 |
127 |
| ST-A100-4SW |
10.4 |
95.2 |
10.4 |
26.5 |
30 |
27 |
116 |
| ST-A100-6(8)VM |
19 |
96 |
19 |
26.5 |
30 |
27 |
134 |
| ST-A100-6(8)SW |
12 |
96 |
12 |
26.5 |
30 |
27 |
120 |
| ST-A150-4VM |
15.5 |
96 |
15.5 |
26.5 |
30 |
27 |
127 |
| ST-A150-4SW |
10.4 |
95.2 |
10.4 |
26.5 |
30 |
27 |
116 |
| ST-A150-6(8)VM |
19 |
96 |
19 |
26.5 |
30 |
27 |
134 |
| ST-A150-6(8)SW |
12 |
96 |
12 |
26.5 |
30 |
27 |
120 |
Performance Data